| Electronic Components Datasheet Search |
|
SMT2000 Datasheet(PDF) 2 Page - List of Unclassifed Manufacturers |
|
|
|||||||||||||||||||||||||||||
SMT2000 Datasheet(HTML) 2 Page - List of Unclassifed Manufacturers |
|
2 / 8 page ![]() PALLAMERSE SMT 2000 2 BATH OPERATION 1. Before heating the bath make sure that the filter cartridge is not in the circulation system. After the last rack is through the Pallamerse tank, shut down the heater and cover the tank. Maintain solution circulation for a minimum of 45 minutes after the heater is turned off. 2. Regularly filter the solution between production periods with circulation pump and 1 micron filter cartridge (when bath temperature is below 50°C). 3. Clean and etch the tank only when significant Pd metal is found in the tank or on the heater: a) Transfer the solution (below 50°C) into a hold- ing tank through a 1 micron filter bag. b) Thoroughly rinse out the working tank with deionized water. Flush or vacuum away metal deposits as much as possible. Remove the water to waste. c) Add etching solution (30 ml/l nitric acid conc., tank volume) to the working tank and circulate the solution for approximately 1 hour and allow the etching solution to remain in the tank overnight. Transfer the solution to a storage container. d) Thoroughly rinse the tank and the pump system with tap water. Discard water; e) Add ammonia solution (approximately 30 ml/l ammonia hydroxide). Adjust pH of the solution above 8.0 with ammonia. Circulate the solution for approximately 0.5 hour. Discard the ammonia solution. f) Repeat step d). g) Use deionized water for final rinse. Discard water. h) Transfer the working solution to working tank through a 1 micron filter bag. Control pH before heating the bath. SOLUTION MAINTENANCE OPERATING NOTES Deposition rate is influenced by palladium concentra- tion, temperature, pH and Pallamerse SMT Reducer concentration. To ensure consistency of deposition rate, maintain these constituents within recommended operating range. Process Sequence Process Temperature Time Ronaclean™ PC-454 57–63°C 3 minutes or PC-921 (135–145°F) Rinse RT 1 minute Rinse RT 1 minute Preposit Etch 748 21-32°C 1 minute (70–90°F) Rinse RT 1 minute Rinse RT 1 minute 20% v/v Hydrochloric Acid RT 1 minute Ronamerse SMT 21–27°C 5–15 minutes Catalyst (70–80°F) depending on substrate Rinse RT 1 minute 20% v/v Hydrochloric Acid RT 1 minute Rinse RT 1 minute DI Rinse RT 1 minute Duraposit™ SMT-88 82–91°C 22 minutes (180–195°F) Rinse RT 1 minute DI Rinse RT 1 minute Ronamerse™ SMT Catalyst 25–35°C 2–3 minutes (78–95°F) Rinse RT 0.5 minutes DI Rinse RT 0.5 minutes Pallamerse SMT 2000 65–70°C 8–12 mins. (149–158°F) (0.10–0.30 µm) (4–12 µinches) Palladium Drag Out RT 1 minute DI Rinse 60°C (140°F) 1 minute Aurolectroless SMT 86°C (187°F) 10 minutes 85–88°C (185–190°F) Gold Dragout RT 1 minute DI Rinse 60°C (140°F) 1 minute Dry |
|
|
Link URL |
| Does ALLDATASHEET help your business so far? [ DONATE ] |
About Alldatasheet | Advertisement | Contact us | Privacy Policy | Link to Datasheet | Link Exchange | Manufacturer List All Rights Reserved©Alldatasheet.com |
| Russian : Alldatasheetru.com | Korean : Alldatasheet.co.kr | Spanish : Alldatasheet.es | French : Alldatasheet.fr | Italian : Alldatasheetit.com Portuguese : Alldatasheetpt.com | Polish : Alldatasheet.pl | Vietnamese : Alldatasheet.vn Indian : Alldatasheet.in | Mexican : Alldatasheet.com.mx | British : Alldatasheet.co.uk | New Zealand : Alldatasheet.co.nz |
|
Family Site : ic2ic.com |
icmetro.com |