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SMT2000 Datasheet(PDF) 2 Page - List of Unclassifed Manufacturers

Part # SMT2000
Description  Autocatalytic process allows high deposit thicknesses to be achieved
PDF  8 Pages
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Manufacturer  ETC1 [List of Unclassifed Manufacturers]
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SMT2000 Datasheet(HTML) 2 Page - List of Unclassifed Manufacturers

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PALLAMERSE SMT 2000
2
BATH OPERATION
1. Before heating the bath make sure that the filter
cartridge is not in the circulation system. After the
last rack is through the Pallamerse tank, shut down
the heater and cover the tank. Maintain solution
circulation for a minimum of 45 minutes after the
heater is turned off.
2. Regularly filter the solution between production
periods with circulation pump and 1 micron filter
cartridge (when bath temperature is below 50°C).
3. Clean and etch the tank only when significant Pd
metal is found in the tank or on the heater:
a) Transfer the solution (below 50°C) into a hold-
ing tank through a 1 micron filter bag.
b) Thoroughly rinse out the working tank with
deionized water. Flush or vacuum away metal
deposits as much as possible. Remove the water
to waste.
c) Add etching solution (30 ml/l nitric acid conc.,
tank volume) to the working tank and circulate
the solution for approximately 1 hour and
allow the etching solution to remain in the
tank overnight. Transfer the solution to a
storage container.
d) Thoroughly rinse the tank and the pump system
with tap water. Discard water;
e) Add ammonia solution (approximately 30 ml/l
ammonia hydroxide). Adjust pH of the solution
above 8.0 with ammonia. Circulate the solution
for approximately 0.5 hour. Discard the
ammonia solution.
f) Repeat step d).
g) Use deionized water for final rinse.
Discard water.
h) Transfer the working solution to working tank
through a 1 micron filter bag. Control pH
before heating the bath.
SOLUTION MAINTENANCE
OPERATING NOTES
Deposition rate is influenced by palladium concentra-
tion, temperature, pH and Pallamerse SMT Reducer
concentration. To ensure consistency of deposition rate,
maintain these constituents within recommended
operating range.
Process Sequence
Process
Temperature Time
Ronaclean™ PC-454
57–63°C
3 minutes
or PC-921
(135–145°F)
Rinse
RT
1 minute
Rinse
RT
1 minute
Preposit Etch 748
21-32°C
1 minute
(70–90°F)
Rinse
RT
1 minute
Rinse
RT
1 minute
20% v/v Hydrochloric Acid RT
1 minute
Ronamerse SMT
21–27°C
5–15 minutes
Catalyst
(70–80°F)
depending on
substrate
Rinse
RT
1 minute
20% v/v Hydrochloric Acid RT
1 minute
Rinse
RT
1 minute
DI Rinse
RT
1 minute
Duraposit™ SMT-88
82–91°C
22 minutes
(180–195°F)
Rinse
RT
1 minute
DI Rinse
RT
1 minute
Ronamerse™ SMT Catalyst 25–35°C
2–3 minutes
(78–95°F)
Rinse
RT
0.5 minutes
DI Rinse
RT
0.5 minutes
Pallamerse SMT 2000
65–70°C
8–12 mins.
(149–158°F)
(0.10–0.30 µm)
(4–12 µinches)
Palladium Drag Out
RT
1 minute
DI Rinse
60°C (140°F)
1 minute
Aurolectroless SMT
86°C (187°F)
10 minutes
85–88°C
(185–190°F)
Gold Dragout
RT
1 minute
DI Rinse
60°C (140°F)
1 minute
Dry



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