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BMA145 Datasheet(PDF) 9 Page - Bosch Sensortec GmbH |
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BMA145 Datasheet(HTML) 9 Page - Bosch Sensortec GmbH |
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9 / 26 page ![]() BMA145 Data sheet Bosch Sensortec 3 BMA145 features 3.1 General description The BMA145 is a fully calibrated, triaxial low-g analog acceleration sensor. It allows measurements of static as well as dynamic accelerations in all three dimensions. Due to its three perpendicular axes it gives the absolute orientation in a gravity field and enables free-fall detection. The sensor is set up as a two-chip arrangement consisting of a three-channel capacity differential MEMS acceleration-sensing element and an application specific integrated circuit (ASIC). Both parts are embedded in a standard, surface mountable land grid array package (LGA). In the following, the LGA packed two-chip arrangement is defined as sensor module. The accelerometer features a low-pass characteristic, with a bandwidth limited to 1.5 kHz (nominal value). This value can further be reduced using external capacitors to improve or customize noise level. It is advised to reduce bandwidth to minimum value required in the application. The bandwidth of all output pins can be selected by the value of the capacitors connected to the Ax, Ay and Az output. Each channel behaves like an independent low-pass RC filter, given by the internal 33kΩ resistor and the external capacitor. The resulting RC low pass filter on Ax, Ay an Az is also valid for the multiplexer output pin. Do not connect an additional external capacitor on the multiplexer output pin. Refer to chapter 4.8 for details. 3.1.1 MEMS element The production of the sensing element is based on standard semiconductor- and standard MEMS processes. The main steps are layer deposition, layer masking and layer structuring in a technology cycle, similar to the standard semiconductor manufacturing. In detail, the process cycle starts with the deposition of a thick epitaxial layer on a sacrificial oxide. The large thickness allows the design of working capacitances of up to 1pF. The poly-layer is patterned by deep reactive ion etching in an inductively coupled plasma (DRIE-ICP, the so-called Bosch process). A large aspect ratio and a very high anisotropy is achieved by periodic passivation of the side walls in between the etch intervals. Afterwards the sacrificial layer is removed. The sensing element is hermetically sealed by a bulk micromachined cap to prevent damages of the structure by dicing, packaging and operation of the device. 3.1.2 ASIC The ASIC is produced in a standard CMOS process. It evaluates, corrects and amplifies the output signal of the MEMS acceleration-sensing element. Simplified considered, the ASIC consists mainly out of 3 capacity voltage converters and 3 signal conditioners, a channel multiplexer, a digital to analog converter an EEPROM memory and an internal RC oscillator. For customized testing an electrostatic force to the sensor electrodes can be induced and compared with a nominal condition. Thus, a general statement about the functional capability of the sensor module can be made at any time. Rev. 1.3 Page 9 / proprietary information 11 February 2010 © Bosch Sensortec GmbH reserves all rights even in the event of industrial property rights. We reserve all rights of disposal such as copying and passing on to third parties. BOSCH and the symbol are registered trademarks of Robert Bosch GmbH, Germany. Note: Specifications within this document are subject to change without notice. |
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